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Method of testing the gate oxide in integrated DMOS power transistors and integrated device comprising a DMOS power transistor

机译:测试集成DMOS功率晶体管中的栅极氧化物的方法以及包括DMOS功率晶体管的集成器件

摘要

A method of testing a DMOS power transistor that includes arranging a switch between low-voltage circuitry and the gate terminal of the DMOS power transistor, maintaining the switch in an open condition, applying a stress voltage to the gate terminal, testing the functionality of the DMOS power transistor, and, if the test has a positive outcome, short-circuiting the switch through zapping by fusing a normally-open fusible link. An integrated circuit device with DMOS transistor is provided that includes a gate terminal of the DMOS transistor coupled to a control element, a normally-open switch element coupled in series between the gate terminal and the control element and including two metallic regions with an insulating between them connected in parallel with the switch element and in series between the gate terminal and the control element.
机译:一种测试DMOS功率晶体管的方法,该方法包括在低压电路和DMOS功率晶体管的栅极端子之间布置开关,将开关保持在断开状态,向栅极端子施加应力电压,测试晶体管的功能。 DMOS功率晶体管,如果测试结果是肯定的,则通过熔断常开的可熔断链,通过短路使开关短路。提供了一种具有DMOS晶体管的集成电路器件,该集成电路器件包括:DMOS晶体管的栅极端子,其耦合至控制元件;常开开关元件,其串联耦合在栅极端子和控制元件之间,并且包括两个金属区域,该两个金属区域之间具有绝缘它们与开关元件并联并串联在栅极端子和控制元件之间。

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