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SWINGING TYPE BOTH-SIDE POLISHING DEVICE

机译:摆动式双面抛光装置

摘要

PROBLEM TO BE SOLVED: To relatively swing a work and a surface plate by a simple swinging mechanism in a both-face polishing device for polishing the both faces of the work by two surface plates with diameter smaller than that of the work.;SOLUTION: This swinging type both-side polishing device is provided with a plurality of support rollers 40 rotatably supporting the outer circumference of a disk work W, a pair of opposed surface plates 11a and 11b with diameter smaller than the work whose both sides are polished in a position near the end, a polishing vessel 39 surrounding the circumference of the work W and the surface plates 11a and 11b, and a pair of swinging mechanisms 43 relatively swinging the work W and the surface plates 11a and 11b in the radial direction of the work W. The support roller 40 is fitted to the polishing vessel 39, and the swinging mechanism 43 is provided with a linear guide 44 extending in the radial direction of the work W, a swinging table 45 movable along the linear guide 44, and a table drive means 46 reciprocating the swinging table 45 along the linear guide 44. The polishing vessel 39 is attached to the swinging table 45 so that the work W is swung via the polishing vessel 39.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:在双面抛光装置中通过简单的摆动机构使工件和面板相对摆动,以用直径小于工件直径的两个面板抛光工件的两个表面。该摆动式双面研磨装置具有:多个支承辊40,其可旋转地支承圆盘工件W的外周;一对相对的面板11a,11b,其直径小于在两面被研磨的工件的直径。在靠近端部的位置,抛光容器39围绕工件W和面板11a和11b的周围,以及一对摆动机构43,其使工件W和面板11a和11b在工件的径向上相对摆动W.支撑辊40被装配到抛光容器39,并且摆动机构43设置有沿工件W的径向延伸的线性引导件44,摆动台45可沿工件W的径向移动。线性导向器44和工作台驱动装置46使摆动工作台45沿着线性导向器44往复运动。抛光容器39安装在摆动工作台45上,从而工件W通过抛光容器39摆动。 C)2001,日本特许厅

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