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Development of Universal Type Polishing Device for Magnetic Abrasive Polishing and its Applications to Fine Polishing

机译:通用型磁性磨料抛光装置的研制及其在精细抛光中的应用

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摘要

A universal type magnetic abrasive polishing device was developed. The developed device can be applied not only to a magnetic attraction method for ferromagnetic materials but also to a centrifugal force method for non-ferromagnetic materials. The device was confirmed to have satisfied abilities by applying it to the polishing of flat surfaces having different magnetic nature by the magnetic attraction method and the centrifugal force method.
机译:开发出通用型磁性研磨剂。所开发的装置不仅可以应用于铁磁材料的磁吸方法,而且可以应用于非铁磁材料的离心力方法。通过用磁引力法和离心力法将其应用于具有不同磁性的平坦表面的抛光,证实了该装置具有令人满意的能力。

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