ABRASIVE GRAIN DISPERSION, COMPOSITION KIT FOR POLISHING CONTAINING THE SAME, MANUFACTURING METHOD OF COMPOSITION FOR POLISHING USING THE SAME, COMPOSITION FOR POLISHING, POLISHING METHOD AND MANUFACTURING METHOD OF SUBSTRATE FOR MAGNETIC DISK

摘要

PROBLEM TO BE SOLVED: To provide a means capable of reducing fine scratch of a polishing object after polishing.;SOLUTION: The invention relates to an abrasive grain dispersion having average primary particle diameter measured by a BET method of 1 nm to 50 nm and a dispersion, and having pH value of 7 to 12, and particle number of the abrasive grain with particle diameter of 0.2 μm or more and less than 0.3 μm measured by number count type particle size distribution counter of 25,000,000 or less per 1 cm³ when the content of the abrasive grain is converted to 30 mass% to total mass of the abrasive grain dispersion.;SELECTED DRAWING: None;COPYRIGHT: (C)2018,JPO&INPIT