Influence of hte abrasive Content and Grain Size on Ultra Smoothness Polishing of Glass Magnetic Disk Substrate

摘要

To produce the compact magnetic disk of high storage capacity by low cost, the high productive ultra smoothness polishing technic of hte magnetic disk substrate has been strongly requested. In previous researches ~1)-6), we have examined the polishing characteristics of electroless nickel phosphorus plated aluminum substrate with alumina abrasives and colloidal silica abrasives, and, on the basis of the reuslt, discussed the optimum ultra smoothness polishing conditions of aluminum substrate. Then the polishing characteristics of the crystallized glass magnetic disk substrate have been discussed by examining experiemtnally the influence of polishing pressure o nthe removal rate and surface smoothness~7).