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CARRIER FOR POLISHING DEVICE AND ITS MANUFACTURING METHOD, BOTH-SIDE POLISHING METHOD, AND MASKING JIG
CARRIER FOR POLISHING DEVICE AND ITS MANUFACTURING METHOD, BOTH-SIDE POLISHING METHOD, AND MASKING JIG
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机译:抛光装置的载体及其制造方法,双面抛光方法和制造夹具
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摘要
PROBLEM TO BE SOLVED: To provide a carrier for a polishing device, which extends a service lifetime of the carrier for the polishing device by improving adhesiveness of a DLC film to a base material of the carrier for the polishing device while preventing the surface of an object to be polished from being damaged.;SOLUTION: In a method for manufacturing the carrier 1 for the polishing device, after exposing a sliding surface of a base material 2, comprising a resin as a matrix, of the carrier 1 for the polishing device to plasma, a DLC film 3 is formed on the sliding surface of the base material. The resin is a fiber-reinforced resin containing one or more kinds of reinforced fibers selected from among glass fibers, aramid fibers, and carbon fibers. In a both-side polishing method, the carrier 1 for the polishing device manufactured by the manufacturing method is arranged between upper and lower polishing plates respectively stuck with a polishing cloth. The object to be polished is set in an opening part 4 of the carrier 1 for the polishing device and polished from both sides thereof.;COPYRIGHT: (C)2009,JPO&INPIT
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