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Semiconductor Optoelectronic Device with a Non-rectangular Substrate

机译:具有非矩形基板的半导体光电器件

摘要

PURPOSE: A photoelectronic semiconductor device having a non-rectangular substrate is provided to reduce abrasion and damage of a cutting tool and improve a yield of dicing process by preventing effectively a die chipping phenomenon. CONSTITUTION: A hexagonal crystal wafer(30) used as a substrate of a GaN-based photo-emission diode is prepared. An n-type GaN-based chemical semiconductor layer(31), an In-GaN-based active layer(32), a p-type GaN-based chemical semiconductor layer(33) are continuously formed on an upper portion of the hexagonal crystal wafer(30). A dry etch process is performed to remove partially the p-type GaN-based chemical semiconductor layer(33), the In-GaN-based active layer(32), and the n-type GaN-based chemical semiconductor layer(31). A p-type electrode(34) and an n-type electrode(35) are formed on the p-type GaN chemical semiconductor layer(33) and the exposed n-type GaN-based chemical semiconductor layer(31), respectively.
机译:目的:提供一种具有非矩形基板的光电子半导体器件,以通过有效地防止芯片破裂现象来减少切削工具的磨损和损坏,并提高切割工艺的成品率。组成:准备了一个六方晶晶片(30)用作GaN基发光二极管的基板。在六方晶体的上部连续形成n型GaN基化学半导体层(31),In-GaN基有源层(32),p型GaN基化学半导体层(33)。晶片(30)。进行干蚀刻工艺以部分地去除p型GaN基化学半导体层(33),In-GaN基有源层(32)和n型GaN基化学半导体层(31)。在p型GaN化学半导体层(33)和露出的n型GaN基化学半导体层(31)上分别形成有p型电极(34)和n型电极(35)。

著录项

  • 公开/公告号KR20020049348A

    专利类型

  • 公开/公告日2002-06-26

    原文格式PDF

  • 申请/专利权人 OPTO TECH CORPORATION;

    申请/专利号KR20000078502

  • 发明设计人 CHYI JEN-INN;LIN MING-DER;TSAI CHANG-DA;

    申请日2000-12-19

  • 分类号H01L33/00;

  • 国家 KR

  • 入库时间 2022-08-22 00:30:47

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