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Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber

机译:沟槽和防溅板,用于在从单个晶圆清洗室转移晶圆时保护晶圆

摘要

A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a gap, and with the upper end of the catch cup positioned at a height equal to or higher than the gutter.
机译:一个单晶片清洗室,包括一个可旋转的托架,该托架可在晶片清洗过程中将晶片放置在收集杯的上端下方,一个沟槽位于晶片传送缝隙上方;收集杯可以与排水沟配合以形成间隙,并且收集杯的上端位于等于或高于排水沟的高度。

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