Novel cross-linking agent in the photoresist, the photoresist polymers and photoresist compositions containing the same

摘要

The present invention discloses a cross-linking monomer for a photoresist polymer represented by following Chemical Formula 1:Chemical Formula 1wherein, V represents CH2, CH2CH2, oxygen or sulfur; Y is selected from the group consisting of straight or branched C1-10 alkyl, oxygen, and straight or branched C1-10 ether; R' and R'' individually represent H or CH3; i is a number of 1 to 5; and n is a number of 0 to 3; and a process for preparing a photoresist copolymer comprising the same.