Novel cross-linking agent in the photoresist, the photoresist polymers and photoresist compositions containing the same

摘要

A cross-linking monomer represented by the following Chemical Formula 1, process for preparing a photoresist polymer using the same, and said photoresist polymer: EMI ID=1.1 HE=77 WI=46 LX=362 LY=782 TI=CF PC```wherein, R' and R'' individually represent hydrogen or methyl; m represents a number of 1 to 10; and R is selected from the group consisting of straight or branched CSB1-10/SB alkyl, straight or branched CSB1-10/SB ester, straight or branched CSB1-10/SB ketone, straight or branched CSB1-10/SB carboxylic acid, straight or branched CSB1-10/SB acetal, straight or branched CSB1-10/SB alkyl including at least one hydroxyl group, straight or branched CSB1-10/SB ester including at least one hydroxyl group, straight or branched CSB1-10/SB ketone including at least one hydroxyl group, straight or branched CSB1-10/SB carboxylic acid including at least one hydroxyl group, and straight or branched CSB1-10/SB acetal including at least one hydroxyl group.