SEMICONDUCTOR DEVICE ANALYZER AND ANALYZING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device analyzer which can accurately analyze a minute structure at the bottom of a hole having a large aspect ratio.;SOLUTION: A substrate current measuring device 100 measures a substrate current which is generated while an electron beam is radiated to the hole which is formed in a semiconductor substrate mounted on a moving stage 102. The measured data of the substrate current are stored in a storage 107 with the data of an irradiating position. A correction processor 108 corrects the fluctuated part of the substrate current depending on the aspect ratio. A computing part 109 refers a reference data base 110 and computes the boundary position and the film thickness of a residual film of the corrected minute structure at the bottom of the hole. Based on the computed result, a display control unit 111 displays an image of the bottom of the hole on a display unit 112.;COPYRIGHT: (C)2004,JPO&NCIPI