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Has the distribution system of the chemical compound for chemical vapor phase vapor deposition method and the distribution system of this chemical compound the thin film manufacturing system

机译:具有用于化学气相沉积法的化合物的分配系统和该化合物的分配系统的薄膜制造系统

摘要

PROBLEM TO BE SOLVED: To provide a supplying system for efficiently realizing a method for supplying thin film raw material for CVD, incorporating a recycle technique.;SOLUTION: This system for supplying compounds for chemical vapor deposition method, provided with a receiving order processor, and a stock amount database, and a billing processor, comprises analyzing means provided with analyzed information output means, which analyze spent compounds returned by a client, and can output analyzed information on at least a weight of non- reacted compounds in the spent compounds; reproducing means provided with reproducing information outputting means, which separate from the non-reacted compounds from the spent compounds and refine them, and output reproducing information on at least an amount of reproduced compounds; and a raw material information database which stores shipping information at an initial shipping of the spent compounds.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种供应系统,该系统有效地实现了一种利用再循环技术来供应用于CVD的薄膜原材料的方法。库存量数据库和计费处理器,包括具有分析信息输出装置的分析装置,该分析装置输出由客户返回的废化合物,并且可以输出有关废化合物中至少未反应化合物的重量的分析信息;提供有再生信息输出装置的再生装置,其从废化合物中与未反应的化合物分离并精制,并输出至少一定量的再生化合物的再生信息;以及一个原材料信息数据库,该数据库在废料初次运输时存储运输信息。;版权所有:(C)2002,日本特许厅

著录项

  • 公开/公告号JP3507445B2

    专利类型

  • 公开/公告日2004-03-15

    原文格式PDF

  • 申请/专利权人 田中貴金属工業株式会社;

    申请/专利号JP20010012942

  • 发明设计人 岡本 浩治;

    申请日2001-01-22

  • 分类号G06F17/60;C23C16/00;

  • 国家 JP

  • 入库时间 2022-08-21 23:24:52

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