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Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask
Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask
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机译:相移掩模坯料的制造方法,相移掩模坯料的制造方法,相移掩模坯料和相移掩模
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摘要
There is disclosed a method of producing a phase shift mask blank wherein the method includes at least a step of forming one or more layers of phase shift films on a substrate by a sputtering method, and in the step, the phase shift films are formed by the sputtering method while simultaneously discharging plural targets having different compositions. Thereby, a phase shift mask blank having a desired composition and quality, in particular, having a phase shift film with few defects can be easily produced.
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