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Pixel array for Detector with thin film transistor and method for fabrication of the same

机译:具有薄膜晶体管的探测器的像素阵列及其制造方法

摘要

PURPOSE: A pixel array for a detector having a TFT(Thin Film Transistor) structure and a manufacturing method thereof are provided to be capable of preventing the attenuation of detected gas or infrared ray information in short time due to thermal conductivity. CONSTITUTION: A pixel array for a detector is provided with a semiconductor substrate(31) having an IC(Integrated Circuit) for reading, a detecting part separated from the semiconductor substrate as much as the height of an air gap, an insulating pillar(35a) for physically connecting the detecting part with the semiconductor substrate. Preferably, the pixel array further includes a protecting layer for enclosing the detecting part. Preferably, the insulating pillar and the protecting layer are made of a silicon nitride layer. Preferably, the detecting part includes a silicon layer, a gate isolating layer(38) on the silicon layer, a gate made of a detecting layer and an absorbing layer(40), a channel region(44) in the silicon layer, and a source/drain region(41a,42a) at both sides of the gate in the silicon layer.
机译:用途:具有TFT(薄膜晶体管)结构的用于检测器的像素阵列及其制造方法被提供为能够防止由于导热性而在短时间内检测到的气体或红外线信息的衰减。构成:用于检测器的像素阵列设置有半导体基板(31),该半导体基板具有用于读取的IC(集成电路),与半导体基板分开的检测部分与气隙的高度一样大,绝缘柱(35a) )以将检测部分与半导体衬底物理连接。优选地,像素阵列还包括用于包围检测部分的保护层。优选地,绝缘柱和保护层由氮化硅层制成。优选地,检测部分包括硅层,硅层上的栅极隔离层(38),由检测层和吸收层(40)制成的栅极,硅层中的沟道区(44),以及硅层中栅极两侧的源/漏区(41a,42a)。

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