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Equipment for exposing PR comprising a reticle loading device and the method of loading the reticle
Equipment for exposing PR comprising a reticle loading device and the method of loading the reticle
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机译:包括掩模版装载装置的用于曝光PR的设备和装载掩模版的方法
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摘要
PURPOSE: A reticle loading method is provided to shorten a time interval of a semiconductor fabricating process and improve efficiency of using an exposure apparatus by avoiding unnecessary time waste while a new reticle is loaded into a reticle stage. CONSTITUTION: A reticle is located on a reticle waiting table of an exposure apparatus before a new wafer is loaded into the exposure apparatus(S330). While the wafer is loaded, the reticle located on the reticle waiting table is loaded into a reticle stage(S340).
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