RETICLE LOADING SYSTEM EQUIPPED WITH APPARATUS FOR REMOVING PARTICLE AND METHOD FOR LOADING RETICLE

摘要

A reticle loading system including a reticle removal device and a reticle loading method thereof are provided to reduce a process time and to improve quality of a wafer by installing an apparatus for cleaning automatically a reticle on the basis of a PPD(Pellicle Particle Detection) inspection. A reticle loading system having a particle removal device(60) includes a robot arm reception unit, a robot arm stage, a compressed air injection hole, and a compressed air exhaust hole. The robot arm reception unit includes the particle remove device. The particle remove device is installed at a lower part of PPD equipment(50). One side of the particle removal device is opened to receive a robot arm(20). The robot arm is loaded on a lower part of a robot arm stage. The compressed air injection hole is moved to inject the compressed air onto an upper surface of reticle. The compressed air exhaust hole is formed at an opposite side to the robot arm reception unit in order to absorb particles separated from the reticle by using the compressed air.