CHAMBER FOR HEATING UNIFORMLY SUBSTRATE WITHOUT CONTAMINATION AT LOW COST

摘要

First equipment is provided for heating substrate in the form of first. First device includes the Room (1) one with a lower end and a upper end; (2) bracket for being used to support at least two substrates of multiple heating is arranged in upper chamber; (3) being configured between the side wall of room and multiple substrate supports in room and a heater with a fringe region and a central area and. Heater generates more heat than the central area edge region of heater. It is provided with a different shape.