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Etching for silicon surfaces and layers, used in photovoltaic, semiconductor and high power electronics technology, for producing photodiode, circuit, electronic device or solar cell, is thickened alkaline liquid
Etching for silicon surfaces and layers, used in photovoltaic, semiconductor and high power electronics technology, for producing photodiode, circuit, electronic device or solar cell, is thickened alkaline liquid
Medium for etching silicon surfaces and layers is a thickened alkaline liquid. An Independent claim is also included for an etching process, in which this medium is applied to all or the required part of the surface and removed again after an action time of 30 seconds to 5 minutes.
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