首页> 外国专利> Local hetero-contact producing device for high-power solar cell, has surface passivated-layer of semiconductor material formed by plasma etching, where foil serves as masking for separation processes of hetero contacts

Local hetero-contact producing device for high-power solar cell, has surface passivated-layer of semiconductor material formed by plasma etching, where foil serves as masking for separation processes of hetero contacts

机译:用于大功率太阳能电池的局部异质接触产生装置,具有通过等离子体蚀刻形成的半导体材料的表面钝化层,其中箔用作异质接触的分离工艺的掩模

摘要

The device has a surface passivated-layer of a semiconductor material formed by plasma etching through openings (45) of a stretched foil (7). The stretched foil serves as a masking for separation processes of hetero contacts, transparent conductive oxide or metals and/or plasma processes. A contact region is exposed to hydrogen plasma after the formation of the layer and is heated to a temperature between 300 [deg] C and 600 [deg] C. An independent claim is also included for a method for producing a local-hetero contact.
机译:该装置具有半导体材料的表面钝化层,该半导体材料的表面钝化层是通过拉伸箔片(7)的开口(45)进行等离子体蚀刻而形成的。拉伸的箔片用作异质接触,透明导电氧化物或金属和/或等离子体工艺的分离工艺的掩膜。在形成层之后,接触区域暴露于氢等离子体并被加热到300℃至600℃之间的温度。还包括用于产生局部-异质接触的方法的独立权利要求。

著录项

  • 公开/公告号DE102006042617A1

    专利类型

  • 公开/公告日2007-09-13

    原文格式PDF

  • 申请/专利权人 SCHERFF MAXIMILIAN;

    申请/专利号DE20061042617

  • 发明设计人 SCHERFF MAXIMILIAN;FAHRNER WOLFGANG R.;

    申请日2006-09-05

  • 分类号H01L21/283;H01L31/18;H01L31/0224;H01L31/042;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:13

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号