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Semiconductor device with gate electrode formed on each of three side surfaces of an active layer, and manufacturing method thereof
Semiconductor device with gate electrode formed on each of three side surfaces of an active layer, and manufacturing method thereof
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机译:在有源层的三个侧面中的每个侧面上形成有栅电极的半导体器件及其制造方法
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摘要
A semiconductor device includes an active layer having a first side surface, a second side surface perpendicular to the first side surface and a third side surface opposite to the second side surface, a first gate electrode arranged on the first side surface with a first gate insulating film disposed therebetween, a second gate electrode formed of a material different from that of the first gate electrode and arranged on the second side surface with a second gate insulating film disposed therebetween, and a third gate electrode formed of a material different from that of the first gate electrode and arranged on the third side surface with a third gate insulating film disposed therebetween.
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