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Semiconductor device with gate electrode formed on each of three side surfaces of an active layer, and manufacturing method thereof

机译:在有源层的三个侧面中的每个侧面上形成有栅电极的半导体器件及其制造方法

摘要

A semiconductor device includes an active layer having a first side surface, a second side surface perpendicular to the first side surface and a third side surface opposite to the second side surface, a first gate electrode arranged on the first side surface with a first gate insulating film disposed therebetween, a second gate electrode formed of a material different from that of the first gate electrode and arranged on the second side surface with a second gate insulating film disposed therebetween, and a third gate electrode formed of a material different from that of the first gate electrode and arranged on the third side surface with a third gate insulating film disposed therebetween.
机译:半导体器件包括:有源层,该有源层具有第一侧面,与第一侧面垂直的第二侧面以及与第二侧面相对的第三侧面;在第一侧面上设置有第一栅极绝缘层的第一栅电极。膜之间设置有第二栅电极,第三栅电极由与第一栅电极不同的材料形成并且布置在第二侧面上,第二栅绝缘膜位于第二栅电极之间,第三栅电极由与第一栅电极不同的材料形成。第一栅电极布置在第三侧表面上,并且第三栅绝缘膜布置在第一栅电极和第二栅电极之间。

著录项

  • 公开/公告号US6919601B2

    专利类型

  • 公开/公告日2005-07-19

    原文格式PDF

  • 申请/专利权人 SATOSHI INABA;

    申请/专利号US20030703004

  • 发明设计人 SATOSHI INABA;

    申请日2003-11-05

  • 分类号H01L27/01;

  • 国家 US

  • 入库时间 2022-08-21 22:20:54

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