LITHOGRAPHY APPARATUS AND METHOD FOR FABRICATING DEVICE TO REDUCE RESIDUAL LIQUID LEFT ON SUBSTRATE AFTER EXPOSURE PROCESS IS PERFORMED BY PROJECTION SYSTEM

摘要

PURPOSE: A lithography apparatus is provided to reduce residual liquid left on a substrate after an exposure process is performed by a projection system by guaranteeing that a liquid supply system is maintained in a predetermined height. CONSTITUTION: A radiation system supplies a projection beam of radioactive rays. A support structure supports a patterning unit functioning to pattern the projection beam according to a desired pattern. A substrate table holds a substrate. A projection system(PL) projects the patterned beam to a target of the substrate, having an optical axial line. A liquid supply system for supplying immersion liquid to the substrate is included in a space between the final element of the projection system and the substrate. At least a part of the liquid supply system freely transfers in a direction of the optical axial line and/or freely rotates with respect to at least one axial line vertical to the optical axial line.