Projection optical system, and projection exposure apparatus having the projection optical system, projection method thereof, exposure method thereof and fabricating method for fabricating a device using the projection exposure apparatus

摘要

A projection optical system having a large numerical aperture in a soft X-ray wavelength range of 200 nm or less, specifically 100 nm or less and a resolution drastically lower than 50 nm, and a projection exposure apparatus provided with the projection optical system.