PURPOSE: Wafer guides used in cleaning and dry processes of a semiconductor substrate is provided to increase dry efficiency of wafers by using an auxiliary wafer guide broader than a main wafer guide or a wafer align unit to uniformly control intervals between the wafers. CONSTITUTION: A support panel is prepared. At least three parallel vertical panels include a central panel that crosses the center of the support panel and is attached to one surface of the support panel. The at least three parallel vertical panels has a vertical body panel(81) and a plurality of protrusions(83) defining a plurality of slots(85) that extend upward from the upper surface of the body panel and hold a plurality of semiconductor wafers(99). An alignment unit controls the real widths of the slots of at least the central panel to make the semiconductor wafers separated from each other by a uniform interval.
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