Fabrication Method of High Resolution Nanopatterns and Metal Dot Arrays with Sub-100nm Feature Size

摘要

PURPOSE: A method for forming a magnetic metal point alignment is provided to freely select a magnetic metal and form a metal pattern having a high aspect ratio according to the property of used mask metal by forming metal patterns of various sizes and shapes by a simple method and by previously depositing magnetic metal of a desired property. CONSTITUTION: A regular porous polymer pattern is formed on a metal thin film that needs to be patterned. Mask metal is selectively deposited in a hole. The polymer layer is selectively eliminated. The metal thin film that needs to be patterned is etched.