ZnO SEED LAYER BY ALD FOR DEPOSITING ZnO NANOSTRUCTURE ON SILICON SUBSTRATE

摘要

PPROBLEM TO BE SOLVED: To provide technique of forming a ZnO nanostructure without using a metal catalyst. PSOLUTION: The technique of growing the nanostructure of zinc oxide without using the metal catalyst by forming a seed layer of polycrystalline zinc oxide on the surface of a substrate is provided. The seed layer can be formed by an atomic layer deposition (ALD) method (102). The growth of the at least one nanostructure of the polycrystalline zinc oxide is induced on the seed layer (103). The seed layer can be formed by an organic metal deposition method, spray pyrolysis method, RF sputtering method, or spin-on method, such as oxidation of the seed layer, as an alternative method. PCOPYRIGHT: (C)2006,JPO&NCIPI