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MRAM architecture with a bit line located underneath the magnetic tunneling junction device

机译:MRAM体系结构,位线位于磁性隧道结器件下方

摘要

A method and system for providing and using a magnetic memory are disclosed. The method and system include providing a plurality of magnetic memory cells, at least a first write line, and at least a second write line. Each of the magnetic memory cells includes a magnetic element having a top and a bottom. The first write line(s) are connected to the bottom of magnetic element of the first portion of the plurality of magnetic memory cells. The second write line(s) reside above the top of the magnetic element of each of a second portion of the magnetic memory cells. The second write line(s) are electrically insulated from the magnetic element of each of the second portion of the plurality of magnetic memory cells.
机译:公开了一种用于提供和使用磁存储器的方法和系统。该方法和系统包括提供多个磁存储单元,至少第一写线和至少第二写线。每个磁存储单元包括具有顶部和底部的磁性元件。第一写入线连接到多个磁性存储单元的第一部分的磁性元件的底部。第二写入线位于磁存储单元的第二部分中的每一个的磁性元件的顶部上方。第二写入线与多个磁性存储单元的第二部分中的每个的磁性元件电绝缘。

著录项

  • 公开/公告号US6982445B2

    专利类型

  • 公开/公告日2006-01-03

    原文格式PDF

  • 申请/专利权人 DAVID TSANG;

    申请/专利号US20030688250

  • 发明设计人 DAVID TSANG;

    申请日2003-10-16

  • 分类号H01L29/76;

  • 国家 US

  • 入库时间 2022-08-21 21:40:39

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