首页> 外国专利> FIELD EFFECT TRANSISTOR IMPROVABLE JUNCTION ABRUPTNESS AND METHOD FOR MANUFACTURING THE SAME

FIELD EFFECT TRANSISTOR IMPROVABLE JUNCTION ABRUPTNESS AND METHOD FOR MANUFACTURING THE SAME

机译:场效应晶体管不能实现的结点简化及其制造方法

摘要

A field effect transistor (FET) and a method for manufacturing the same, in which the FET may include an isolation film formed on a semiconductor substrate to define an active region, and a gate electrode formed on a given portion of the semiconductor substrate. A channel layer may be formed on a portion of the gate electrode, with source and drain regions formed on either side of the channel layer so that boundaries between the channel layer and the source and drain regions of the FET may be perpendicular to a surface of the semiconductor substrate.
机译:场效应晶体管(FET)及其制造方法,其中FET可以包括形成在半导体衬底上以限定有源区的隔离膜,以及形成在半导体衬底给定部分上的栅电极。可以在栅电极的一部分上形成沟道层,并且在沟道层的任一侧上形成源极和漏极区域,使得沟道层与FET的源极和漏极区域之间的边界可以垂直于FET的表面。半导体衬底。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号