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How to simulate the reticle layout data, examines the reticle layout data to generate the inspection process of the reticle layout data
How to simulate the reticle layout data, examines the reticle layout data to generate the inspection process of the reticle layout data
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机译:如何模拟掩模版布局数据,检查掩模版布局数据以生成掩模版布局数据的检查过程
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摘要
Various methods that are implemented in a computer can be obtained. Identifying includes One method of generating a process for inspecting the reticle layout data, the area of the first reticle layout data. Printability of the first region in the reticle layout data is sensitive to changes in process parameters than the printability of the second region. In this way, even the step of assigning a test parameter of the one or more second regions of the first process, and to be inspected in a higher sensitivity than the second region is the first region are included. In one method, the examination of the first region with higher sensitivity than the second region is included in the other. In another way, a simulation of how the reticle layout data is printed is further included. Is performed by the simulation parameters one or more different, simulation of the second region and the first region is simulated fidelity first region is higher than the second region.
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