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How to simulate the reticle layout data, examines the reticle layout data to generate the inspection process of the reticle layout data

机译:如何模拟掩模版布局数据,检查掩模版布局数据以生成掩模版布局数据的检查过程

摘要

Various methods that are implemented in a computer can be obtained. Identifying includes One method of generating a process for inspecting the reticle layout data, the area of ​​the first reticle layout data. Printability of the first region in the reticle layout data is sensitive to changes in process parameters than the printability of the second region. In this way, even the step of assigning a test parameter of the one or more second regions of the first process, and to be inspected in a higher sensitivity than the second region is the first region are included. In one method, the examination of the first region with higher sensitivity than the second region is included in the other. In another way, a simulation of how the reticle layout data is printed is further included. Is performed by the simulation parameters one or more different, simulation of the second region and the first region is simulated fidelity first region is higher than the second region.
机译:可以获得在计算机中实现的各种方法。识别包括一种生成用于检查掩模版布局数据,第一掩模版布局数据的面积的过程的方法。标线版图数据中的第一区域的可印刷性比第二区域的可印刷性对工艺参数的变化敏感。这样,甚至包括分配第一处理的一个或多个第二区域的测试参数并且以比第二区域更高的灵敏度进行检查的是第一区域的步骤。在一种方法中,另一种方法包括以比第二区域更高的灵敏度检查第一区域。以另一种方式,进一步包括对掩模版布局数据如何被打印的模拟。是由一个或多个不同的仿真参数执行的,对第二区域和第一区域的仿真保真度是第一区域高于第二区域。

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