Integrated circuit design and system design support program used design method for an integrated circuit, the design method for an integrated circuit

摘要

PROBLEM TO BE SOLVED: To provide a photomaskless prototype method having both the advantages of a photomaskless prototype method capable of creating a prototype without producing a photomask and the advantages of a photomask prototype method capable of using pattern information at the time of trial production as it is in mass production. Provided are a design method of an integrated circuit that realizes a photomaskless / photomask fusion method that combines a photomask prototype method, a design support program and an integrated circuit design system that are used in the design method of the integrated circuit. A photomask under a common design environment that can be used in a photomaskless process for creating an integrated circuit without using a photomask based on pattern information and a photomask process for creating an integrated circuit using a photomask based on pattern information. Based on pattern information for prototyping corresponding to the less process and photomask process, a prototype of an integrated circuit is created without using a photomask. After evaluation, improvements are made as necessary to create common pattern information, and the common pattern information is improved. A formal mask is generated and used for mass production by performing a formal conversion as necessary without adding it. [Selection] Figure 2