Plasmonic array for maskless lithography

摘要

In various embodiments, a photolithography system comprises a spatial light modulator and a plasmonic lens array. The spatial light modulator comprises a plurality of pixels, and the plasmonic lens array comprises a plurality of plasmonic lenses. The pixels are optically aligned with the plasmonic lenses such that light from the pixels is substantially focused by the lenses. The plasmonic lenses each comprise an optical aperture and a plurality of metal features proximal to the aperture. The metal features have a dimension and arrangement configured to couple optical energy incident on one side of the plasmonic lens into plasmon excitation supported by the metal and to reemit optical energy through the aperture.