首页> 外国专利> METHOD FOR RECYCLING THE DISPOSED SLUDGE PRODUCED IN THE MANUFACTURING PROCESS OF THE SILICON WAFER

METHOD FOR RECYCLING THE DISPOSED SLUDGE PRODUCED IN THE MANUFACTURING PROCESS OF THE SILICON WAFER

机译:回收硅晶片制造过程中产生的沉积污泥的方法

摘要

The present invention relates to a method for reproducing the waste sludge generated during the semiconductor wafer fabrication , in greater detail relates to a reproducing method for waste sludge generated during the production of semiconductor wafers that can be played by a number of cutting material and effectively remove the cutting oil from the disposed sludge . The present invention is a 65 ~ 90 heat supply to the heating step to lower the viscosity of the disposed sludge and waste sludge ; The first centrifugation step of separating the primary centrifugal sludge heated in the heat supply to the solid phase and the liquid phase min; And provides a playback method for waste sludge generated during the production of semiconductor wafers , characterized in that comprises a second centrifugal separation step to separate the secondary centrifugal separated liquid minutes in the first centrifugation step to the cutting branch coolant .
机译:半导体晶片制造过程中产生的废渣的再生方法技术领域本发明涉及半导体晶片制造过程中产生的废渣的再生方法。处置的污泥中的切削油。为降低污泥和废渣的粘度,加热阶段的供热温度为65〜90。第一离心步骤是分离在热量供应中加热到固相和液相中的初级离心污泥的最小值min;并提供了一种半导体晶片生产过程中产生的废渣的回收方法,其特征在于包括第二离心分离步骤,以将第一离心步骤中的二次离心分离液分钟分离到切割分支冷却液中。

著录项

  • 公开/公告号KR100703963B1

    专利类型

  • 公开/公告日2007-04-04

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20050052623

  • 发明设计人 장영철;

    申请日2005-06-17

  • 分类号H01L21/02;H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 20:32:28

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号