NEW AMINE SURFACTANTS FOR USE IN CARBON DIOXIDE, METHOD FOR PREPARATION THEREOF AND METHOD FOR IMPROVING THE EFFICIENCY OF CLEANING OF CARBON DIOXIDE FLUID ON THE VARIOUS MICROELECTRONIC STRUCTURES

摘要

The present invention relates to amine-based surfactant, and a method of manufacturing a new type of environment-friendly can be applied to carbon dioxide. Amine of the novel amine surfactants described above is characterized in that it holds a linear or branched hydrocarbon moiety, or a substituted acetyl group sex pro dioxide (CO ₂ philic) and at the same time indicates the hydrophilicity of the ionizable nitrogen derived. It may also be derivatized with various acid forms, halogen flame type, betaine type or amine oxide type to impart further hydrophilicity. Such a surface active agent of the invention is inexpensive, various substrates using not limited to biological good to a property of absorbing water, with liquid or supercritical carbon dioxide, for example a semiconductor substrate, the micro-mechanism composite devices (MEMs), the display contaminants from a panel or like photoelectric device (optoelectronic device), for example is effective in the removal of water, a water-soluble solvent (developer) and an ionic by-product. Accordingly, the present invention provides the use of a new amine surfactants of the present are useful in removing contamination of various electronic substrate using a carbon dioxide fluid invention. ; Fluid carbon dioxide, the amine surfactant, a semiconductor cleaning