首页> 外国专利> NEW AMINE SURFACTANTS FOR USE IN CARBON DIOXIDE, METHOD FOR PREPARATION THEREOF AND METHOD FOR IMPROVING THE EFFICIENCY OF CLEANING OF CARBON DIOXIDE FLUID ON THE VARIOUS MICROELECTRONIC STRUCTURES

NEW AMINE SURFACTANTS FOR USE IN CARBON DIOXIDE, METHOD FOR PREPARATION THEREOF AND METHOD FOR IMPROVING THE EFFICIENCY OF CLEANING OF CARBON DIOXIDE FLUID ON THE VARIOUS MICROELECTRONIC STRUCTURES

机译:用于二氧化碳的新型胺表面活性剂,其制备方法和提高各种微电子结构上二氧化碳流体清洁效率的方法

摘要

The present invention relates to amine-based surface active agent and a method capable of applying the new type of environmentally friendly carbon dioxide. An amine of the novel amine surfactants described above is characterized in that the retention of the hydrophilic substituted with a linear or branched hydrocarbon residue of a low molecular weight, acetyl or pro-dioxide sex (CO 2 philic) represents the ionized nitrogen and possibly at the same time origin. It may also be derivatized with various acid form, a halogen flame type, betaine type or amine oxide type to impart further hydrophilicity. Such a surface active agent of the invention is cheap and, not limited to the biological the property to absorb water good to, various types of substrates used with the liquid or supercritical carbon dioxide, for example a semiconductor substrate, a micro-mechanism composite devices (MEMs), a display such as from the panel or opto-electronic device (optoelectronic device) is effective to remove contaminants such as water, a water-soluble solvent (developer) and an ionic by-product. Accordingly, the present invention relates to novel amines useful in the present invention for removing contamination of various electronic substrate using a carbon dioxide fluid provides the use of a surface active agent.
机译:胺类表面活性剂和方法本发明涉及胺类表面活性剂和能够使用新型环保二氧化碳的方法。上述新型胺表面活性剂的胺的特征在于,亲水性被低分子量,乙酰基或亲二氧化性(CO 2 亲和性)的直链或支链烃残基取代代表离子化的氮,可能同时起源。它也可以用各种酸形式,卤素火焰型,甜菜碱型或氧化胺型衍生化以赋予进一步的亲水性。本发明的这种表面活性剂便宜,并且不限于与液体或超临界二氧化碳一起使用的各种类型的基底(例如半导体基底,微机械复合装置)的良好的吸收水的生物学性质。 (MEMs),诸如来自面板或光电装置(光电装置)的显示器可有效去除污染物,例如水,水溶性溶剂(显影剂)和离子副产物。因此,本发明涉及可用于本发明的新型胺,其用于使用二氧化碳流体去除各种电子基材的污染,并提供了表面活性剂的用途。

著录项

  • 公开/公告号KR20050119017A

    专利类型

  • 公开/公告日2005-12-20

    原文格式PDF

  • 申请/专利权人 LIM KWON TAEK;

    申请/专利号KR20040044196

  • 发明设计人 LIM KWON TAEK;HWANG HA SOO;

    申请日2004-06-15

  • 分类号C11D1/75;C11D1/62;

  • 国家 KR

  • 入库时间 2022-08-21 21:27:47

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