NITRIDING DEVICE BY IONIC IMPLANTATION OF A GOLD ALLOY PART AND METHOD USING SUCH A DEVICE

摘要

The invention relates to an ion implantation device in a gold alloy part (5) comprising an ion source (6) delivering ions accelerated by an extraction voltage and first adjustment means (7). -11) of an initial beam (f1 ') of ions emitted by said source (6) into an implantation beam (f1). The source (6) is an electron cyclotron resonance source producing the initial beam (f1 ') of multi-energy ions that are implanted in the workpiece (5) at a temperature below 300 ° C. The implantation of these multi-energy ions of the implantation beam (f1) regulated by means of said adjustment means (7-11) is performed simultaneously at a depth controlled by the extraction voltage of the source.