METHOD OF MANUFACTURING MULTI-GRADATION PHOTOMASK, MULTI-GRADATION PHOTOMASK, AND PATTERN TRANSFER METHOD

摘要

PPROBLEM TO BE SOLVED: To provide a method of manufacturing a multi-gradation photomask comprising a light shielding part, a light- transmissive part, and light transflective parts different by transmittance, on a transparent substrate. PSOLUTION: The method includes a step of preparing a photomask blank having a light shielding film 15 on a transparent substrate 14, a step of forming a first resist pattern by drawing and developing a resist film formed on the light shielding film, and a step of performing first patterning by etching the light shielding film with the first resist pattern as a mask. After removal of the first resist pattern, a first light transflective film 16 is formed throughout a surface of the substrate, and second patterning is performed by etching at least the first light transflective film with a second resist pattern formed on the film 16 as a mask. After removal of the second resist pattern, a second light transflective film 17 is formed throughout the surface of the substrate, and third patterning is performed by etching at least the second light transflective film 17 with a third resist pattern formed on the film 17 as a mask. PCOPYRIGHT: (C)2010,JPO&INPIT