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NON-UNIFORM MINORITY CARRIER LIFETIME DISTRIBUTION IN HIGH PERFORMANCE SILICON POWER DEVICE

机译:高性能硅功率器件中的非均匀少数族裔载流子寿命分布

摘要

PPROBLEM TO BE SOLVED: To provide a segment having a required profile of minority carrier recombination centers, and a method of manufacturing such segment, by heat-treating a single crystal silicon segment. PSOLUTION: The segment has a front surface, a back surface, and a central plane between the front and back surfaces. This method makes the segment subject to a heat treatment to form crystal lattice vacancies, the vacancies being formed in the bulk of the silicon. The segment is then cooled from the temperature of the heat-treatment at a rate which allows some, but not all, of the crystal lattice vacancies to diffuse to the front surface to manufacture a segment having a vacancy concentration profile in which the peak density is at or near the central plane, and the concentration generally decreases in the direction of the front surface of the segment. Platinum atoms are then in-diffused into the silicon matrix such that the resulting platinum concentration profile is substantially related to the concentration profile of the crystal lattice vacancies. PCOPYRIGHT: (C)2010,JPO&INPIT
机译:

要解决的问题:提供一种具有所需的少数载流子复合中心轮廓的链段,以及通过热处理单晶硅链段来制造这种链段的方法。

解决方案:该线段具有一个前表面,一个后表面以及位于该前表面和后表面之间的中心平面。该方法使该段经受热处理以形成晶格空位,该空位形成在大部分硅中。然后以允许部分但不是全部晶格空位扩散到前表面的速率从热处理温度冷却段,以制造具有空位浓度分布的段,其中峰值密度为在中心平面处或附近,浓度通常在段的前表面方向上降低。然后将铂原子扩散到硅基质中,以使所得的铂浓度分布基本上与晶格空位的浓度分布有关。

版权:(C)2010,日本特许厅&INPIT

著录项

  • 公开/公告号JP2009239269A

    专利类型

  • 公开/公告日2009-10-15

    原文格式PDF

  • 申请/专利权人 MEMC ELECTRON MATERIALS INC;

    申请/专利号JP20090046375

  • 发明设计人 ROBERT J FALSTAR;

    申请日2009-02-27

  • 分类号H01L21/338;H01L29/778;H01L29/812;H01L21/322;H01L29/861;H01L29/744;

  • 国家 JP

  • 入库时间 2022-08-21 19:46:06

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