首页> 外国专利> PRETREATMENT LIQUID FOR PROMOTING STARTING OF ELECTROLESS PALLADIUM PLATING REACTION, ELECTROLESS PLATING METHOD USING THE PRETREATMENT LIQUID, CONNECTION TERMINAL FORMED BY THE ELECTROLESS PLATING METHOD, AND SEMICONDUCTOR PACKAGE USING THE CONNECTION TERMINAL AND ITS MANUFACTURING METHOD

PRETREATMENT LIQUID FOR PROMOTING STARTING OF ELECTROLESS PALLADIUM PLATING REACTION, ELECTROLESS PLATING METHOD USING THE PRETREATMENT LIQUID, CONNECTION TERMINAL FORMED BY THE ELECTROLESS PLATING METHOD, AND SEMICONDUCTOR PACKAGE USING THE CONNECTION TERMINAL AND ITS MANUFACTURING METHOD

机译:用于促进无电钯电镀反应开始的预处理液,使用该预处理液的无电电镀法,由无电电镀法形成的连接端子,以及由连接端子及其制造方法制成的半导体封装

摘要

PROBLEM TO BE SOLVED: To provide a pretreatment liquid for promoting starting of electroless palladium plating reaction for forming a film of uniform thickness by suppressing non-formation of electroless palladium plating film formed on a plated body functioned as a protective layer for an electroless nickel plating alloy film or reduction in thickness, an electroless plating method using the same, a connection terminal, a semiconductor package using the connection terminal, and its manufacturing method.;SOLUTION: Disclosed are the pretreatment liquid for promoting starting of electroless palladium plating reaction for immersing the electroless palladium plating film before forming to promote starting of the electroless palladium plating reaction when performing depositing the electroless nickel plating alloy film, the electroless palladium plating film, and a substitution gold plating film on the plated body, or further performing electroless plating for depositing the electroless plating film, the electroless plating method using the pretreatment liquid, the connection terminal formed by the electroless plating method, the semiconductor package using the connection terminal, and its manufacturing method.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种预处理液,其通过抑制形成在用作化学镀镍的保护层的镀覆体上的化学镀钯膜的不形成,来促进化学镀钯反应的开始,以形成均匀厚度的膜的预处理液。合金膜或厚度减小的薄膜,使用该薄膜的化学镀方法,连接端子,使用该连接端子的半导体封装及其制造方法。解决方案:公开了用于促进浸入式化学镀钯反应开始的预处理液当在电镀体上进行化学镀镍镍合金膜,化学镀钯膜和置换金镀膜的沉积,或者进一步进行化学镀以沉积时,形成前的化学镀钯膜以促进化学镀钯反应的开始。化学镀薄膜,使用预处理液的化学镀方法,通过化学镀方法形成的连接端子,使用该连接端子的半导体封装及其制造方法。;版权所有:(C)2009,JPO&INPIT

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