Dow Electron. Mater., Fanling, China;
catalysts; electroplating; finishing; nickel; organic compounds; palladium; printed circuit manufacture; sputter etching; ENIG; MHC; NPTH; Ni; PCB production; Pd; acid cleaning; aquatic organisms; copper etching; electroless nickel immersion gold process; hydrochloric acid; make hole conductive process; metal finishing; metal plating elimination; microetching; nonplated through holes; palladium catalyst; palladium deactivation pretreatment process; printed circuit board production; product manufacturing; thiourea; waste tre;
机译:温湿处理对化学镀镍金(ENIG)和化学镀镍钯金(ENEPIG)表面处理的环氧树脂Sn-58Bi焊料弯曲可靠性的影响
机译:化学镀镍沉金(ENIG)沉积中的凸块下冶金(UBM)的表面特性
机译:当今的挑战是通过浸金电镀工艺开发选择性化学镍
机译:无电镀镍浸泡金工艺(ENIG)的钯失活预处理方法:消除非镀孔的金属电镀(NPTH)
机译:当改变铜浓度和回流工艺时,化学铜上的(铜,镍)锡金属间化合物形成动力学。
机译:通过缺陷诱导化学镀制备用于SLS工艺的镍/ PA12复合颗粒
机译:化学镀镍浸金(ENIG)柔性印刷电路板上电沉积Co-Ni-Fe保护膜的腐蚀研究