首页> 外国专利> A pretreatment liquid for electroless plating, an electroless plating bath and an electroless plating method (PRETREATMENT SOLUTION FOR ELECTROLESS PLATING, ELECTROLESS PLATING BATH AND ELECTROLESS PLATING METHOD)

A pretreatment liquid for electroless plating, an electroless plating bath and an electroless plating method (PRETREATMENT SOLUTION FOR ELECTROLESS PLATING, ELECTROLESS PLATING BATH AND ELECTROLESS PLATING METHOD)

机译:用于化学镀的预处理液,化学镀浴和化学镀方法(用于无电镀,电解镀浴和无电镀方法的沉淀溶液)

摘要

An electroless plating technique capable of positively advancing the plating reaction without performing the Pd substitution treatment and capable of accelerating the precipitation of plating can be applied to a primary plating film (or a metal film) formed on a substrate by a secondary plating (Electroless plating), wherein the surface potential of the primary plating film is higher than the lowest surface potential at which the surface current density of the primary plating film becomes 0 in the electroless plating solution of the secondary plating And a second plating step is carried out after adjusting the thickness of the electroless plating bath so as to be further lowered, and a pretreatment liquid for electroless plating containing a pH adjusting agent, a reducing agent and a complexing agent suitable for use in carrying out the electroless plating bath and the electroless plating bath .
机译:通过二次镀覆(化学镀)可以在基板上形成的一次镀膜(或金属膜)上应用可以不进行Pd置换处理而积极地促进镀敷反应,并且可以加速镀敷的析出的化学镀技术。 ),其中第一镀膜的表面电势高于在第二镀膜的化学镀溶液中第一镀膜的表面电流密度变为0的最低表面电势,并在调节后进行第二镀膜步骤化学镀浴的厚度以进一步降低,以及适合用于进行化学镀浴和化学镀浴的包含pH调节剂,还原剂和络合剂的化学镀预处理液。

著录项

  • 公开/公告号KR970701275A

    专利类型

  • 公开/公告日1997-03-17

    原文格式PDF

  • 申请/专利权人 엔도 마사루;

    申请/专利号KR19960704700

  • 发明设计人 유안 벤젠;아사이 모토;

    申请日1996-08-27

  • 分类号C23C18/52;C23C18/18;

  • 国家 KR

  • 入库时间 2022-08-22 03:16:12

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