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PRETREATMENT SOLUTION FOR ELECTROLESS PLATING, ELECTROLESS PLATING BATH AND ELECTROLESS PLATING METHOD

机译:无电电镀,无电电镀浴和无电电镀方法的预处理解决方案

摘要

Plating reaction can be reliably promoted without performing Pd substitution treatment, and electroless plating technique can be used to speed up plating deposition. Secondary plating is performed on a primary plating film (or metal film) formed on a substrate. In the electroless plating method of performing electroless plating, the surface potential of the primary plating film is lower than the lowest surface potential at which the surface current density of the primary plating film becomes zero in the electroless plating solution of the secondary plating. Electroless plating method characterized in that the secondary plating is carried out after adjusting to a lower level, and an electroless plating pretreatment liquid and an electroless plating bath containing a pH adjuster, a reducing agent and a complexing agent suitable for use in performing the same. Suggest.
机译:可以不进行Pd置换处理而可靠地促进镀覆反应,可以使用化学镀技术来加速镀覆沉积。在基板上形成的一次镀膜(或金属膜)上进行二次镀膜。在执行化学镀的化学镀方法中,一次镀膜的表面电势低于在二次镀的化学镀溶液中一次镀膜的表面电流密度变为零的最低表面电势。化学镀方法,其特征在于,在将第二镀液调节至较低水平之后进行,并且所述化学镀预处理液和化学镀浴包含pH调节剂,还原剂和络合剂,该电镀液和pH调节剂适用于进行电镀。建议。

著录项

  • 公开/公告号KR1002358500000B1

    专利类型

  • 公开/公告日1999-12-15

    原文格式PDF

  • 申请/专利权人 IBIDEN CO. LTD.;

    申请/专利号KR1019960704700

  • 发明设计人 유안 벤젠;아사이 모토;

    申请日1996-08-27

  • 分类号C23C18/52;C23C18/18;

  • 国家 KR

  • 入库时间 2022-08-22 01:46:20

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