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PRETREATMENT SOLUTION FOR ELECTROLESS PLATING, ELECTROLESS PLATING BATH AND ELECTROLESS PLATING METHOD

机译:无电电镀,无电电镀浴和无电电镀方法的预处理解决方案

摘要

As an electroless plating technique capable of surely promoting the plating reaction without Pd substitution reaction and fastening the plating deposition, there are proposed an electroless plating method of subjecting a primary plated film (or metal film) formed on a substrate to a secondary plating (or electroless plating), characterized in that the secondary plating is carried out after a surface potential of the primary plated film is adjusted so as to be more base than such a most base surface potential that a surface current density of the primary plated film is zero in an electroless plating solution for the secondary plating, and a pretreating solution for electroless plating containing pH adjusting agent, reducing agent and complexing agent and an electroless plating bath suitable for use in this method.
机译:作为能够在没有Pd取代反应的情况下确实地促进镀敷反应并固定镀敷沉积的无电解镀敷技术,提出了对基板上形成的一次镀膜(或金属膜)进行二次镀敷(或(化学镀),其特征在于,在将一次镀膜的表面电位调整为比在一次镀膜的表面电流密度为零的最基础表面电位更大的基础上进行二次镀敷。适用于该方法的包含pH调节剂,还原剂和络合剂的化学镀液,用于二次镀覆的化学镀液以及用于化学镀覆的预处理溶液和化学镀浴。

著录项

  • 公开/公告号EP0747507B1

    专利类型

  • 公开/公告日2001-02-14

    原文格式PDF

  • 申请/专利权人 IBIDEN CO LTD;

    申请/专利号EP19950932961

  • 发明设计人 ASAI MOTOO;YUAN BENZHEN;

    申请日1995-10-03

  • 分类号C23C18/52;C23C18/18;H05K3/18;C23C18/28;

  • 国家 EP

  • 入库时间 2022-08-22 01:17:09

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