首页> 外国专利> METHOD OF PREDICTING DIMENSIONAL CONVERSION DIFFERENCE, METHOD OF MANUFACTURING PHOTOMASK, METHOD OF MANUFACTURING ELECTRONIC PART, AND PROGRAM OF PREDICTING DIMENSIONAL CONVERSION DIFFERENCE

METHOD OF PREDICTING DIMENSIONAL CONVERSION DIFFERENCE, METHOD OF MANUFACTURING PHOTOMASK, METHOD OF MANUFACTURING ELECTRONIC PART, AND PROGRAM OF PREDICTING DIMENSIONAL CONVERSION DIFFERENCE

机译:预测尺寸转换差的方法,制造光电掩模的方法,制造电子零件的方法以及尺寸转换差的预测程序

摘要

PPROBLEM TO BE SOLVED: To provide a method of predicting a dimensional conversion difference, a method of manufacturing a photomask, a method of manufacturing an electronic part, and a program of predicting a dimensional conversion difference that can increase the accuracy of dimensional conversion difference prediction irrespective of the shape of a pattern. PSOLUTION: The method of predicting a dimensional conversion difference includes computing an open angle at an error prediction point from design pattern data and predicting a dimensional conversion difference according to the correlation of the open angle with a measured value of dimensional conversion difference. Alternatively, the method includes computing the incident amount of incident objects at a conversion difference prediction point from design data and predicting a dimensional conversion difference according to the correlation of the incident amount with a measured value of dimensional conversion difference. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:提供一种预测尺寸转换差异的方法,一种制造光掩模的方法,一种制造电子零件的方法以及一种可以提高尺寸精度的预测尺寸转换差异的程序。转换误差预测与图案的形状无关。

解决方案:预测尺寸转换差的方法包括:根据设计图案数据在误差预测点处计算张角;以及根据张角与尺寸转换差的测量值的相关性来预测尺寸转换差。可替代地,该方法包括从设计数据计算在转换差预测点处的入射物体的入射量,并根据入射量与尺寸转换差的测量值的相关性来预测尺寸转换差。

版权:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP2009080349A

    专利类型

  • 公开/公告日2009-04-16

    原文格式PDF

  • 申请/专利权人 TOSHIBA CORP;

    申请/专利号JP20070250221

  • 发明设计人 IYANAGI KATSU;

    申请日2007-09-26

  • 分类号G03F1/08;H01L21/3065;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 19:43:32

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