首页> 外国专利> DIMENSION CONVERSION DIFFERENCE PREDICTING METHOD, PHOTOMASK MANUFACTURING METHOD, ELECTRONIC COMPONENT MANUFACTURING MEHTOD, AND DIMENSION CONVERSION DIFFERENCE PREDICTING PROGRAM

DIMENSION CONVERSION DIFFERENCE PREDICTING METHOD, PHOTOMASK MANUFACTURING METHOD, ELECTRONIC COMPONENT MANUFACTURING MEHTOD, AND DIMENSION CONVERSION DIFFERENCE PREDICTING PROGRAM

机译:尺寸转换差预测方法,光掩模制造方法,电子元件制造方法和尺寸转换差预测程序

摘要

A dimension conversion difference predicting method, photomask manufacturing method, electronic component manufacturing method, and dimension conversion difference predicting program are provided to improve the prediction accuracy of the dimension conversion difference regardless of the shape of pattern. The incidence quantity of the incident object at the predicted point is obtained based on design data for conversion(S110). The dimension conversion difference is predicted based on correlation with the experimental value of the incidence quantity and the dimension conversion difference(S112). The incident angle at the predicted point is obtained for conversion based on design data. Subsequently, the incidence quantity is obtained based on the incident angle. The angular distribution of the incident object is obtained based on design data. Subsequently, the incidence quantity is obtained based on the angular distribution of the incident water.
机译:提供尺寸转换差异预测方法,光掩模制造方法,电子元件制造方法以及尺寸转换差异预测程序,以提高尺寸转换差异的预测精度,而与图案的形状无关。基于用于转换的设计数据获得在预测点处的入射物体的入射量(S110)。基于与入射量的实验值和尺寸转换差的相关性来预测尺寸转换差(S112)。根据设计数据获得预测点的入射角以进行转换。随后,基于入射角获得入射量。基于设计数据获得入射物体的角度分布。随后,基于入射水的角度分布来获得入射量。

著录项

  • 公开/公告号KR20090032011A

    专利类型

  • 公开/公告日2009-03-31

    原文格式PDF

  • 申请/专利权人 KABUSHIKI KAISHA TOSHIBA;

    申请/专利号KR20080094159

  • 发明设计人 IYANAGI KATSUMI;

    申请日2008-09-25

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 19:13:45

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