COMPOSITION FOR FORMING RESIST UNDERLAYER FILM EXHIBITING BARRIER PROPERTY, AND METHOD OF EVALUATION BARRIER PROPERTY OF RESIST UNDERLAYER FILM

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming a resist underlayer film exhibiting a barrier property, and a method of evaluation the barrier property of the resist underlayer film by converting it into a proper numeric value.;SOLUTION: This composition for forming the resist underlayer film exhibiting the barrier property, contains a compound having an aromatic ring bonded with at least one hydroxyl group, an organic solvent, and a crosslinking agent. The barrier property of the resist underlayer film is evaluated using results obtained by determining: an amount of a sublimate generated when baking the first resist underlayer single layer in a prescribed condition; an amount of a sublimate generated when forming the second resist underlayer single layer by baking of a prescribed condition; and an amount of a sublimate generated when forming the second resist underlayer on the first resist underlayer by baking in a prescribed condition.;COPYRIGHT: (C)2009,JPO&INPIT