FILM-FORMING MATERIAL, LITHOGRAPHIC FILM-FORMING COMPOSITION, OPTICAL COMPONENT-FORMING MATERIAL, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RESIST PERMANENT FILM, RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM PRODUCTION METHOD, LITHOGRAPHIC UNDERLAYER FILM-FORMING MATERIAL, LITHOGRAPHIC UNDERLAYER FILM-FORMING COMPOSITION, LITHOGRAPHIC UNDERLAYER FILM PRODUCTION METHOD, AND CIRCUIT PATTERN FORMATION METHOD

摘要

Provided is a film-forming material that comprises a triazine-based compound represented by formula (1), that can be used in a wet process, and that is useful for forming: a lithographic film that has excellent heat resistance, resist pattern shape, etching resistance, embedding characteristics on a stepped substrate, and film flatness; and an optical component or the like that has excellent heat resistance, transparency, and refractive index.