EXTREME ULTRAVIOLET LIGHT SOURCE EQUIPMENT, AND METHOD OF CAPTURING HIGH-SPEED PARTICLE IN EXTREME ULTRAVIOLET LIGHT SOURCE EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To capture a high-speed ion and a high-speed atom and control the damage of an EUV collecting mirror caused by the high-speed ion and the high-speed atom without providing a foil trap.;SOLUTION: Discharge gas is supplied to a plasma-generating unit 2. High voltage pulse is applied to a portion between first and second main discharge electrodes 2a and 2b from a discharge circuit 11a of a high voltage pulse generating unit 11. Consequently, high temperature plasma is generated and extreme ultraviolet light whose wavelength is 13.5 nm is emitted. The extreme ultraviolet light is collected by a collecting reflection mirror 4 and emitted from an EUV light extraction unit 6. Pulse power is supplied from a discharge circuit 11b to a portion between the second main discharge electrode 2b and a third electrode 15 approximately at the same timing as that of the discharge between the first and second main discharge electrodes 2a and 2b. Consequently, plasma P2 is generated and high-speed particles generated by the high temperature plasma are captured by an electric field and a magnetic field generated by the generated plasma P2.;COPYRIGHT: (C)2009,JPO&INPIT