An extreme ultraviolet light source device, a laser light source device for an extreme ultraviolet light source device, and a method of adjusting a laser light source device for an extreme ultraviolet light source device

摘要

An extreme ultraviolet light source device that generates extreme ultraviolet light by irradiating a laser beam on a target material (DP) to convert the target material (DP) into a plasma, comprising: a target material (DP) supply unit (15) supplying the target material (DP) into a chamber (10); a laser oscillator that outputs a laser beam; an amplification system (30) amplifying the laser beam output from the laser oscillator by at least one amplifier; and a focusing system (40) for radiating the laser beam amplified by the amplification system (30) to the target material (DP) in the chamber (10); wherein at least the amplification system (30) is equipped with: at least a first detector unit (36) which detects a direction of the laser beam and a shape of a wavefront thereof in the amplification system (30) or detects beam parameters equivalent to the direction of the laser beam and the shape of the wavefront thereof in the amplification system (30), at least a first compensation unit (44) compensating the direction of the laser beam and the shape of the wavefront thereof detected by the first detector unit (36) to a predetermined direction and a predetermined wavefront shape, and at least one compensation control unit (50) that controls compensation by the first compensation unit (44) according to a result of the detection performed by the first detector unit (36).