An extreme ultraviolet light source device, a laser light source device for an extreme ultraviolet light source device, and a method of adjusting a laser light source device for an extreme ultraviolet light source device

摘要

An EUV light source device properly compensates the wavefront of a laser beam that is changed by heat. A wavefront compensator and a sensor are provided in the amplification system that amplifies the laser beam. The sensor detects and outputs changes in the angle (direction) of the laser beam and the curvature of the wavefront thereof. A wavefront compensation controller outputs a signal to the wavefront compensator based on the measurement results from the sensor. The wavefront compensator corrects the wavefront of the laser beam to a given wavefront according to a command from the wavefront compensation controller.