首页> 外国专利> SEMICONDUCTOR DEVICE HAVING THROUGH-SILICON VIAS FOR HIGH CURRENT,HIGH FREQUENCY, AND HEAT DISSIPATION

SEMICONDUCTOR DEVICE HAVING THROUGH-SILICON VIAS FOR HIGH CURRENT,HIGH FREQUENCY, AND HEAT DISSIPATION

机译:具有硅通孔的半导体器件,可实现高电流,高频率和散热

摘要

An integrated circuit device (100) with a semiconductor chip (101) having vias (103) two-dimensionally arrayed across the chip area. The metal-filled via core is suitable for electrical power and ground and heat dissipation, or for high frequency signals; at the top, the core is connected to transistors (102), and at the bottom to a metal stud (420.) The device further has a two-dimensional planar array of substantially identical metallic pads (120) separated by gaps (123, 223.) The array has two sets of pads: The first pad set (124) is located in the array center under the chip; the pad locations match the vias and each pad is in contact with the stud of the respective via. The second pad set (125) is located at the array periphery around the chip; these pads have bond wires (150) to a respective transistor terminal. Encapsulation compound (110) covers the chip and the wire connections, and fills the gaps between the pads.
机译:一种具有半导体芯片( 101 )的集成电路器件( 100 ),该半导体芯片具有在整个芯片区域上二维排列的过孔( 103 )。填充金属的通孔磁芯适用于电源,地线和散热,或高频信号。该器件在顶部连接到晶体管( 102 ),在底部连接到金属螺柱( 420。)。该设备还具有二维平面阵列由间隙( 123、223。)隔开的基本相同的金属焊盘( 120 )组成。阵列具有两组焊盘:第一组焊盘( 124 )位于芯片下方的阵列中心;焊盘的位置与通孔匹配,并且每个焊盘都与相应通孔的螺柱接触。第二焊盘组( 125 )位于芯片周围的阵列外围;这些焊盘具有到相应晶体管端子的键合线( 150 )。密封剂( 110 )覆盖芯片和导线连接,并填充焊盘之间的间隙。

著录项

  • 公开/公告号US2009115026A1

    专利类型

  • 公开/公告日2009-05-07

    原文格式PDF

  • 申请/专利权人 MARK GERBER;GENE ALAN FRANTZ;

    申请/专利号US20070934860

  • 发明设计人 MARK GERBER;GENE ALAN FRANTZ;

    申请日2007-11-05

  • 分类号H01L29/40;H01L21/02;

  • 国家 US

  • 入库时间 2022-08-21 19:33:04

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