CHEMICAL VAPOR DEPOSITION APPARATUS WHICH PREVENTS POLLUTION OF CHAMBER INSIDE BY CONTAMINANT

摘要

PURPOSE: A chemical vapor deposition apparatus is provided to easily discharge exhausted gas and block inflow of contaminant inside the chamber.;CONSTITUTION: A chemical vapor deposition apparatus comprises a gas exhausting unit (30) and contamination preventing material (40). The gas exhausting unit is installed at the center of the chamber (10) to discharge gas to the central direction along the upper side. A susceptor is equipped inside the chamber. The contamination preventing material makes gas of chamber inside pass. And the contamination preventing material is equipped in the exhausting unit to preventing from passage of a contaminant (P).;COPYRIGHT KIPO 2010